800 nm process - Misplaced Pages

(Redirected from 800 nanometer) Semiconductor manufacturing processes with a 800 nm MOSFET technology node

Semiconductor device fabrication

MOSFET scaling (process nodes)
020 μm – 1968 010 μm – 1971 006 μm – 1974 003 μm – 1977 1.5 μm – 1981 001 μm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 028 nm – 2010 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2025
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
v t e

The 800 nm process (800 nanometer process) is a level of semiconductor process technology that was reached in the 1987–1990 timeframe, by companies, such as Intel, ATI Technologies, and IBM.

The 800 nm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 800 nanometers wide.

Products featuring 800 nm manufacturing process

50-MHz i486DX CPU launched in 1991 was manufactured using this process.
Both 25/50 and 33/66 MHz Intel486 DX2 CPU using this process.
Early version of Intel486 SX2 using this process.
microSPARC I launched in 1992
First Intel P5 Pentium CPUs at 60 MHz and 66 MHz launched in 1993

References

"ATI EGA Wonder 800+ Specs". TechPowerUp. Retrieved 2022-09-16.
Chen, Allan, "The 50-MHz Intel486 Microprocessor", Intel Corporation, Microcomputer Solutions, September/October 1991, page 2
Intel Corporation, "Coming Attractions: Clock-Doubling Technology", Microcomputer Solutions, January/February 1992, page 6
Intel Corporation, "Coming Attractions: Clock-Doubling Technology", Microcomputer Solutions, January/February 1992, page 6

Preceded by
1 µm

CMOS manufacturing processes

Succeeded by
600 nm

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